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Features

• Exellent printability with low viscosity

• Easy operation with low alkali developing

• Excellent resolution with small under-cut, apply to narrow pitch of QFP pads.

• Excellent heat resistance to molten solder, electrical insulation resistance and chemical attack resistance.

• Excellent resistance against electroles gold plating.

PLAS FINE PER-series are UV curable etching resist that can resist iron(II) chloride solution or copper (II) chloride solution.

Swelling type: PER-210B; Swelling-dissolving type: PER-208B; Dissolving type: PER-27B

Features

• Excellent high resolution, good adhesion.

• Excellent acid resistance

• Easy removal by alkali

PLAS FINE PSR-310 series are UV curable solder resists, suitable for rigid PCBs.

Features

• Excellent high resolution, good adhesion.

• Excellent acid resistance

• Easy removal by alkali

PLAS FINE PSR-310W are UV curable marking ink which are excellent in printing.

Features

• Excellent adhesion to substrates

• Excellent in solder resistance

• Excellent high resolution.

Conductive Ink (Silver paste) - PLAS FINE PAF-22G

PLAS FINE PAF-22G is composed of highly controlled silver powder and functional resin. This ink is suitable for flexible PCBs.

Conductive Ink (Carbon paste) - PLAS FINE PCF-1038

PLAS FINE PCF-1038 is composed of high conductivity carbon fillers and functional resin. This ink is suitable for flexible PCBs.

Liquid Photo imageable pattern resist - PLP system

PLP system - Plugging and Liquid Photo  imageable is one of the methods of manufacturing PCBs. This system needs UV-curable plugging ink and liquid photo imageable pattern resist.

UV curable plugging ink (Solvent free) - PLAS FINE PTR-924W, PTR-626

PLAS FINE PTR-924W, PTR-626 is UV curable plugging ink which containts no solvants. In process chippings and dents are covered and it makes flat surface. This ink is especially suitable for using with liquid photo resist ink.

Features

• Short curing time

• Almost no shrinkage because no solvent contained

• Good in scraping

• Good resistance against developer

• Good matching with liquid photo resist